Apparatuses, device, and methods for cleaning tester interface contact elements and support hardware

ABSTRACT

A medium for predictably cleaning the contact elements and support hardware of a tester interface, such as a probe card and a test socket, while it is still in manual, semi-automated, and automated handling device and the electrical test equipment is disclosed so that the functionality and performance of the individual die or IC package may be electrically evaluated.

FIELD

The disclosure relates generally to a device for cleaning testerinterface contact elements and support hardware.

BACKGROUND

Individual semiconductor (integrated circuit) devices are typicallyproduced by creating a plurality of devices on a silicon wafer usingwell known semiconductor processing techniques that can includephotolithography, deposition, and sputtering. Generally, these processesare intended to create fully-functional integrated circuit devices (ICs)at the wafer level. Eventually, the individual IC devices aresingulated, or diced, into the separate and individual dies from thesemiconductor wafer. Singulated IC devices are assembled for finalcompletion in packages or incorporation into electronic apparatus usingwell known assembly techniques that can include die attach to alead-frame, wire bonding or solder ball attach, and encapsulationusually by various molding techniques to provide a body to the packagewith external electrical connectivity.

In practice, however, physical defects in the wafer itself and/ordefects in the processing of the wafer can inevitably lead to some ofthe dies on the wafer being either fully-functional, some of the diesbeing non-functional, and some of the dies have lower performance or theneed for repair. It is generally desirable to identify which of the dieson a wafer are fully functional preferably prior to singulation from thewafer and assembly into consumer devices. Non-functional, lowerperforming, and repairable devices due to certain physical defects inthe wafer, defects in the IC circuit layers, and/or defects related tothe semiconductor processing techniques are identified prior tosingulation by a process called wafer-level test (often referred to inthe arts as “wafer sort”). Sorting, or binning, IC devices at the waferlevel according to the product's capabilities where the productperformance is determined by electrical testing can save themanufacturer considerable cost later in the manufacturing process aswell as provide increased revenue from the sales of the highestperforming devices.

Once the device has been singulated, certain process steps duringhandling and assembly can inevitably lead to dicing defects, handlingdefects, assembly and packaging related defects that can only beidentified electrically to bin devices as fully-functional,non-functional, or potentially “repairable”. In practice, assembled andpackaged semiconductor devices are subject to a series of electricaltesting processes prior to their final completion or incorporation intoelectronic apparatus. The process at package level or final test priorto shipment includes, but is not limited to, testing of singulateddevices either bare die, packaged IC (temporary or permanent), orvariants in between.

Commonly, electrical testing of the IC devices at either the wafer levelor package level is accomplished by means of automatic test equipment(ATE) configured mechanically and electrically for stimulating thesemiconductor devices, exercising the device according to apre-determined test routine, and then examining the output for assessingproper functionality

At wafer level test, conventional interface hardware is a “probe card”to which pluralities of probe elements that match the layout of thedevice under test (DUT) input/output (I/O) pads, are connected. Morespecifically, in the typical wafer testing process, the probe card ismounted to the prober, and probe contact elements (simply referred to as“probes”) are brought into contact with bonding pads, solder ballsand/or gold bumps formed on the dies of the wafer. By exertingcontrolled displacement of the probe tips against the bonding pads,solder balls and/or gold bumps, an electrical connection is achievedallowing the power, ground and test signals to be transmitted. Repeatedscrub, deformation, and penetration of the probe tips against thebonding pads, solder balls and/or gold bumps, produces debris andcontaminants that adhere and accumulate onto the probe contact surface.

At package level test, a tester load board provides interface betweenautomated test equipment (ATE), or manual test equipment, and the DUT.The tester load board conventionally includes one or more contactorassemblies, sometimes referred to as “test socket(s)” into which DUT(s)is (are) inserted. During the testing process, a DUT is inserted orplaced into the socket by the handler and held into position for theduration of testing. After insertion into the socket, the DUT, via thepin elements, is electrically connected to the ATE through the testerload board, its sub assemblies, and other interfacing apparatus. Contactpin elements associated with the ATE are placed in physical andelectrical contact with the metallized contact surfaces of the DUT.These surfaces may include test pads, lead wire, pin connectors, bondpads, solder balls, and/or other conductive media. The functionality ofDUTs is evaluated through various electrical inputs and measuredresponses on outputs. With repeated testing, the contact element tip canbecome contaminated with materials such as aluminum, copper, lead, tin,gold, bi-products, organic films or oxides resulting from the wafer andsemiconductor device manufacturing and testing processes.

One of the major challenges encountered with both types of IC testing(wafer level and package level) is ensuring optimal electrical contactbetween the contact pins associated with the contactor element, and thecontact surfaces of the DUT. In each test procedure, with repeatedcontact the pin contact elements onto bonding pads, solder balls and/orgold bumps, debris and other residuals will accumulate and contaminatethe contact area of the pin elements. This debris may originate from thetesting and handling process itself, or may include manufacturingresidue from the device fabrication and/or assembly process(es) or fromother sources.

In addition to the presence of contaminants, repeatedly forcingelectrical current through the small intermetallic “a-spots” of thecontact pins can degrade the conductivity characteristics of contactsurfaces, thus affecting the intermetallic quality for proper electricaltesting. As the contaminants accumulate, coupled with degradation ofcontact surfaces, the contact resistance (CRES) rises and reduces thereliability of the tests. Increasing and unstable CRES can impact yieldand/or test time as yield recovery testing increases. Such erroneousreadings can lead to the false rejection of otherwise good DUTsresulting in, often dramatic, yield loss. Some yield recovery may bepossible through multi-pass testing; however, retesting devices multipletimes to verify a bad device or to attain yield recovery causes theoverall production costs to increase.

High performance demands for wafer level and package level testcontactor technologies have furthered the development of uniquely shapedcontact elements with predetermined and customized mechanicalperformance and elastic properties. Many of the new advanced contacttechnologies have unique contact element geometries and mechanicalbehavior to facilitate consistent, repeatable, and stable electricalcontact. Some of the technologies are constructed using lithographicassembly techniques; while others are fabricated with high accuracymicro-machining techniques. Improved electrical characteristics of thecontactors are also attained using various materials with improvedelectrical performance and resistance to oxidation. The contact elementsare engineered to facilitate consistent oxide penetration while reducingthe applied bearing force onto the bonding pads, solder balls and/orgold bumps. It is still necessary to make physical contact with thebonding pads, solder balls and/or gold bumps; thereby, generating debrisand contamination that could affect the results from the electricalperformance testing procedures.

Typically, the generated debris needs to be periodically removed fromthe contact elements to prevent a build-up that causes increased contactresistance, continuity failures and false test indications, which inturn result in artificially lower yields and subsequent increasedproduct costs.

In response to the problem of particles adhering to the contact elementand supporting hardware, a number of techniques have been developed. Forexample, one technique uses cleaning materials composed of a siliconerubber which provides a matrix for abrasive particles. In addition, acleaning wafer with a mounted abrasive ceramic cleaning block which isrubbed against the probe needles may be used or a rubber matrix withabrasive particles and a brush cleaner made of glass fibers also may beused. In one technique, the probe needles may be sprayed or dipped in acleaning solution. In another technique, open cell foam based cleaningdevice with a random surface morphology of voids and variable heightsmay be used.

In one conventional contact element cleaning process, some combinationof brushing, blowing, and rinsing the contact pins and/or contactorbodies is employed. This process requires stopping the testingoperation, manual intervention to perform the cleaning, and possiblyremoving the test interface (probe card, socket, etc.) from the testenvironment. This method provides inconsistent debris removal and maynot provide sufficient cleaning action within the geometric features ofshaped contact elements. After cleaning, the test interface must bereinstalled and the test environment reestablished so that testing mayresume. In some cases, the contact elements are removed, cleaned, andreplaced resulting in elevated costs due to unscheduled equipmentdowntime.

In another conventional method, a cleaning pad with an abrasive surfacecoating or abrasively coated polyurethane foam layer is used to removeforeign materials adhering to the contact elements. Adherent foreignmaterials are abraded off the contact elements and supporting hardwareby repeatedly scrubbing the contact elements against (and possibly into)the cleaning pad. The process of cleaning using an abrasive padburnishes the contact element but it does not necessarily remove debris.In fact, the burnishing actually causes abrasive wear to the contactelements thereby changing the shape of the contact geometry andshortening the useful life of the contactor.

Maximum cleaning efficiency is attained when the removal of the debrisfrom the contact element and supporting hardware is performedconsistently and predictably during the cleaning process. The process ofcleaning using an abrasive pad constructed from open celled foam doesnot provide consistent cleaning. In fact, the burnishing action by therandomly oriented and uncontrolled foam structures causes non-uniformabrasive wear as well as preferential abrasive wear to the contactelements thereby unpredictably changing the shape of the contactgeometry and mechanical performance of the contact element and supporthardware; thereby, unpredictably shortening the useful life of thecontactor.

In the industry, it has been seen that the tester interface hardwareconsisting of a plurality of contact elements, as many as 150,000 testprobe elements, and the support hardware can cost as much as $600K perATE test cell. Premature wear-out and damage due to improper ornon-optimal cleaning practices can equate to millions of US dollars perannum per ATE test cell. Therefore, with thousands of ATE test cellsoperating worldwide, the impact to the repair, maintenance, andreplacement costs can be very substantial.

Another attempt to improve upon the conventional probe cleaning processincludes using a tacky abrasively filled or unfilled polymeric cleaningmaterial to remove the foreign materials. More specifically, the polymerpad is brought into physical contact with the contact elements. Adherentdebris is loosened by the tacky polymer and sticks to the polymersurface; thereby removed from the contact elements and other testhardware. The polymer materials are designed to maintain the overallshape of the contact elements; however, interaction with the polymerlayer may not provide sufficient cleaning action within the geometricfeatures of shaped contact elements.

When cleaning with abrasively filled or abrasively coated materialsfilms that have a continuous, uniform surface or a surface with randomlyoriented and randomly spaced surface features, preferential abrasion ismanifested through “edge pin” effects (for example, peripheral contactelements of a test probe array are abrasively worn at different ratesthan the contact element within the array); or through “neighbor pinspacing” effects (for example, closely spaced contact elements are wornat different rates than widely spaced contact elements); or through“neighbor pin orientation” effects (for example, spatial proximity ofcontact elements can cause preferential and asymmetric wear of contactelements). Non-uniform abrasive wear of contact elements and supporthardware will affect the performance consistency during the ICsemiconductor device testing and could result in unexpected yield loss,equipment downtime, and repair costs.

Typical contact element cleaning processes at wafer level and packagelevel testing can be expensive for the end-user since the contactors maybe uncontrollably worn away at different rates by the abrasive-basedcontact cleaning processes. When using abrasive particles of identicalcomposition and size, exemplary test data (FIG. 1) shows that the rateof wear-out or dimensional reduction for critical contact elementgeometries can be dramatically affected by relatively small changes(approximately 2 to 3%) to the compliance of the abrasive materiallayers, surface features, and that of the under-layers. Data curves 101,102, 103, and 104 demonstrate the rate at which the reduction in contactelement length occurs as the overall compliance of the cleaningmaterials is modified and reduced. Data curve 101 represents a compliantmaterial which has the lowest wear out rate; and Data curve 104represents a rigid compliant material which has the highest wear outrate. With thousands of IC device testing units (probers and handlers)operating worldwide, the impact to the industry from maintaining cleancontact elements without premature wear out during testing can be verysubstantial.

None of these methods adequately address a cleaning device and methodthat incorporates a cleaning pad construction with multiple layers ofdifferent material and mechanical properties, predetermined geometricalfeatures, and surface treatments to predictably control the overallcleaning material performance. In addition, the equipment and manuallabor to repair and replace contactors that have been worn away by anabrasive contact cleaning process adds additional costs to the taskperformed. Accordingly, there is a need for improved methods andapparatuses for cleaning and maintaining the contact elements.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows test data showing contact element critical size reductionas a function of “touchdown” cycles on abrasive pads with a 3-umparticle size, but with controlled differences in the materialcompliance;

FIG. 2A illustrates a conventional example of a DUT (at wafer level orat package level) with probe pads; electrical contact elements and anATE interface (probe card or test socket);

FIG. 2B is a schematic of an example of a DUT (at wafer level or atpackage level) with probe pads, electrical contact elements and an ATEinterface (probe card or test socket);

FIG. 3A is a top view of a typical cleaning device with cleaning padapplied to a wafer surface;

FIG. 3B is a sectional view of a typical cleaning device with a cleaningpad applied to a substrate surface;

FIG. 3C is a sectional view of a typical cleaning device with a cleaningpad applied to an IC package;

FIG. 4A is a sectional view of a cleaning medium that has one or moreintermediate complaint material layers below a cleaning pad layer;

FIG. 4B is a sectional view of a cleaning medium with one or moreintermediate rigid material layers below a cleaning pad layer ofpredetermined properties;

FIG. 4C is a sectional view of a cleaning medium that has one or moreintermediate rigid and compliant material layers beneath a cleaning padlayer of predetermined properties;

FIG. 4D is a sectional view of a cleaning medium with one or morealternating intermediate rigid and compliant material layers beneath acleaning pad layer of predetermined properties;

FIG. 5A is a sectional view of a cleaning material with evenly spacedmicro-columns of a predetermined geometry constructed onto one or morematerial layers of predetermined properties;

FIG. 5B is a sectional view of a cleaning material with evenly spacedmicro-columns of a predetermined geometry constructed from a combinationof one or more intermediate rigid and compliant material layers ofpredetermined properties;

FIG. 6A is an enlarged sectional view of a evenly spaced micro-columnsconstructed from a combination of one or more intermediate materiallayers to attain a consistent cleaning efficacy into the contact area ofa test probe;

FIG. 6B is an enlarged sectional view of a evenly spaced micro-pyramidsconstructed from a combination of one or more intermediate materiallayers to attain a consistent cleaning efficacy into the contact area ofa test probe;

FIG. 7A is a plan view of a portion of mutually decoupled micro-featuresusing an array of “streets” for resultant second moment of area orinertia to control the resistance to bending;

FIG. 7B is a plan view of a portion of mutually decoupled micro-featuresusing an array of “avenues” for resultant second moment of area orinertia to control the resistance to bending;

FIG. 7C is a plan view of a portion of mutually decoupled micro-featuresusing an array of diagonals for second moment of area or inertia tocontrol the resistance to bending;

FIG. 8A is a sectional view of a cleaning material with micro-columnsfor cleaning the contact tip area of a cantilevered test probe for waferlevel test; and

FIG. 8B is a sectional view of a cleaning material with micro-columnsfor cleaning the within contact tip of crown point and single point testprobes used for wafer level, chip scale, and package level test.

DETAILED DESCRIPTION OF ONE OR MORE EMBODIMENTS

The disclosure is particularly applicable to a cleaning pad forelectrical test probes that have contact elements with a predeterminedgeometry (i.e., crown tipped spring probes, spear tipped probes, etc.)and support structures used for tester interface devices utilized forwafer level and package level testing (i.e., probe cards, test sockets,and other similar interface devices) and it is in this context that thedisclosure will be described. It will be appreciated, however, that thecleaning materials, device, and method has greater utility, such ascleaning test interfaces utilized by other types of IC semiconductordevice evaluation equipment, such as spring pin ring interfaces, ZIFFmale/female connectors, etc.

The device is a complaint cleaning medium with surface characteristicsfor having specific abrasive and debris removal efficacies to cleanelectrical contact elements and structures used for tester interfacesdevices utilized for wafer level and package level testing (i.e., probecards, test socket, and other similar interface devices). A high levelof cleaning efficacy can be obtained using appropriate intermediatelayers, surface micro-features, and variable abrasiveness that can beselected, depending on the type and shape of contact elements beingcleaned, the composition and the quantity of debris to be removed, andthe affinity of the debris to the contact surface. The contact elementsbeing cleaned can be any type of test probe, such as tungsten needles,vertical probes, cobra probes, MEMs type probes, plunger probes, springprobes, sliding contacts, contact bump probes formed on a membrane, etc.

In more detail, the cleaning material may be constructed from one ormore layers, each with predetermined mechanical, material, anddimensional characteristics, such as abrasiveness, density, elasticity,tackiness, planarity, thickness, porosity, so that when the pin elementscontact the pad surface, the contact area and surrounding supporthardware are cleaned such that the debris and contaminates are removed.

The cleaning device may have a sacrificial top protective layer ofmaterial that may be applied before, during, or after the fabricationprocess to protect and isolate the cleaning material surface fromcontamination during manufacturing process and manual handlingoperations. The sacrificial layer is removed upon installation into thesemiconductor testing equipment and is used to ensure that the workingsurface of the cleaning material is free of any contamination that wouldcompromise the cleaning performance of the contact elements by cleaningmaterial.

The individual layers of the cleaning material may be made of solidelastomeric materials or porous, open celled or closed foam materialsthat may include rubbers and both synthetic and natural polymers as wellas polyurethanes, acrylics, etc., or other known elastomeric materials.The top layer of the cleaning material may have a predeterminedabrasiveness, elasticity, density and surface tension parameters thatallow the probe tips to deform and penetrate the elastomeric material toremove the debris on the contact area without damage to the geometry ofthe contact elements, while retaining the integrity of the elastomericmatrix.

The cleaning material also may have a multi-layered structure in whichone or more complaint layers are arranged or stacked to attain apredetermined overall compliant performance so that when the pinelements contact and deform the pad surface, a defined reciprocal forceis imparted by the material into the contact area and structures toincrease the efficiency at which the debris and contaminates areremoved. Furthermore, the cleaning material may have a multi-layeredstructure in which the surface layer is populated with a plurality ofuniformly shaped and regularly spaced, geometric micro-features, such asmicro-columns, micro-pyramids, or other such structural micro-features,of a pre-determined aspect ratio (diameter to height), cross-section(square, circular, triangular, etc.) and abrasive particle loading toimprove debris removal and collection efficiency. The micro-features maybe made of solid elastomeric material or porous, open celled or closedfoam materials that may include rubbers and both synthetic and naturalpolymers as well as polyurethanes, acrylics, etc., or other knownelastomeric materials. In other embodiments, the micro-features may haveabrasive particles applied to the top surface, along the length of themicro-feature, within the body of the micro-feature, or at the base ofthe micro-feature. In particular, an average micro-feature could have across-section widths of 1.0-μm or more, with a height of 400-μm or lessand an average abrasive particle size of less than 15.0-μm. Typicalabrasives that may be incorporated into and across the material layersand micro-features may include aluminum oxide, silicon carbide, anddiamond although the abrasive particles may also be other well knownabrasive materials with Mohs Hardness of 7 or greater.

In other embodiments, the micro-features are mutually decoupled andformed with a predetermined geometry for a second moment of area orinertia to control the resistance to bending using an array of “streets”and “avenues” to remove undesirable interactions and other coupledeffects and attain a predetermined surface compliance so that when thepin elements contact the pad surface, a reciprocal force is imparted bythe material into the contact area, within the contact element tipgeometry, and support structures to increase the efficiency at which thedebris and contaminates are removed. The mutually decoupledmicro-features have predetermined dimensions to provide predictable anduniform reciprocal forces onto each test probe within the contactelement array and supporting hardware. Decoupled micro-features acrossthe surface of the cleaning material are formed to reduce and eliminate“edge pin” effects, “neighbor pin spacing” effects, and “neighbor pinorientation” effects.

In another aspect of the cleaning device, the micro-features may have aparticular uniform surface finish such that the prober/tester device iscapable of detecting the surface of the cleaning pad. The surfacetexture and roughness of the cleaning material may also contribute tothe cleaning efficiency of the working surface polymer material.

In one aspect of the method, the cleaning medium may be manually placedwithin the automated test equipment, such as a wafer prober or packageddevice handler, in a predetermined location so that pin elements andsurfaces will interact with the cleaning medium periodically to removedebris and/or clean the contact surfaces of the pin elements withoutexcessively wearing out the test probe. In another aspect of the method,a method for cleaning the probe elements on a wafer prober or packagedevice handler is provided wherein the method comprises loading thecleaning medium into the wafer prober or package device handler in aform similar to a semiconductor wafer, a singulated IC device, or apackaged IC device being tested and the cleaning medium having a topsurface with predetermined properties, such as abrasiveness, tack,hardness, that clean the contact elements and support structure. Themethod further comprises contacting the contact elements with thecleaning medium during the normal testing operation in wafer prober orpackage device handler so that any debris is removed from the probeelements during the normal operation of the wafer prober or packagedevice handler.

When the prober/tester is capable of detecting the surface of thecleaning pad, then the prober is able to be set into an automaticcleaning mode. In the automatic cleaning mode, the prober/tester willautomatically determine when to clean the test probe contact elements,locate the cleaning device, clean the probe tips and then return totesting operations. In another embodiment of the cleaning device, thelayers of the cleaning medium may be formed from conductive materialssuch that a tester/prober that detects a surface using conductance isable to detect the surface of the cleaning medium.

A typical IC semiconductor testing system (shown schematically in FIGS.2A and 2B) typically includes some type of tester 10, a test head 11, atester interface 12 (e.g., probe card or test socket), contact elements13, and a wafer or device handler 16. The electrical contact elements13, or test probes, within the tester interface extend from the testerinterface to allow direct contact with the DUT 15. DUTs (wafers,singulated devices, or packaged ICs) are moved using automated,semi-automatic, or manual equipment into the appropriate physicalposition such that probe pads 14 and/or solder balls 16 are in alignmentwith the contact elements 13 of the tester interface 12. Once inposition, the DUT 15 is moved against the contact elements 13 or thecontact elements 13 are moved against the DUT 15 for electrical testing.With repeated touchdowns, the contact elements become contaminated.Instead of the removing the test interface for cleaning, the cleaningmedium of a predetermined construction will clean the geometricaldefined contact elements during the normal testing operation.

FIGS. 3A, 3B, and 3C illustrate three typical different types ofcleaning devices manufactured with a cleaning medium applied to varioussubstrate materials, different size substrates, different shapesubstrates or without a substrate in some applications. As shown inFIGS. 3A and 3B, cleaning device 20 and 21, respectively, may include asubstrate 23 and a cleaning medium, or pad, 24 secured, adhered, orapplied to a surface of a wafer or to substrate of known geometry,respectively. The substrate 23 may be plastic, metal, glass, silicon,ceramic or any other similar material. Furthermore, a substrate 25 mayhave a geometry that approximates the geometry of the packaged ICdevice, or DUT, 22 whereby the cleaning medium 24 is attached to thesurface bearing the contact elements of the test probes and supportinghardware.

Now, a cleaning medium with one or more intermediate complaint layers isdescribed in more detail with reference to the accompanying drawings andembodiments. In one embodiment (shown in FIG. 4A), a cleaning medium 220may be made from a cleaning pad layer 202 of predetermined properties,such as hardness, elastic modulus, etc., that contribute to the cleaningof the contact elements that contact the pad. The cleaning medium 220may also have one or more intermediate compliant layers 203 attached toand below the cleaning pad layer. The combinations of layers producesmaterial properties unavailable from the individual constituentmaterials, while the wide variety of matrix, abrasive particles, andgeometries allows for a product or structure that has to choose anoptimum combination to maximize cleaning performance. By addingcompliant or microporous foam underlayers beneath a rigid cleaninglayer, the overall abrasive wear characteristics of the cleaningmaterial are reduced and/or the tip shaping performance are enhanced inorder to extend the overall service life of the probe element withoutcompromising the shape or function of the contact geometry. For example,application of the abrasive particle layer onto a rigid polyester filmcreates a lapping film type cleaning material with stock removalcharacteristics used to create and maintain a probe contact elementswith flat contact area geometries. Application of the same abrasiveparticle layer to the surface of a compliant unfilled polymer or the“skin” side of a microporous foam, results in multi-layered materialwith preferential stock removal characteristics for creating andmaintaining a probe contact element with a radius or semi-radius contactarea geometry. As the overall compliance of the underlayer(s) issystematically increased (or rigidity is decreased), the overallabrasive wear characteristics of the cleaning material transition fromcreating and maintaining a flat tip contact area geometry to creatingand maintaining a radius or semi-radius contact area geometry.

The cleaning medium 220 may also have a removable protective layer 201that is installed prior to the intended usage for contact elementcleaning in order to isolate the surface cleaning pad layer fromnon-test related contaminants. The removable protective layer 201protects the working surface of the cleaning pad layer 202 fromdebris/contaminants until the cleaning device is ready to be used forcleaning a tester interface in a clean room. When the cleaning device isready to be used for cleaning a tester interface in a clean room, theremovable protective layer 201 may be removed to expose the workingsurface of the cleaning pad layer 202. The protective layer may be madeof a known non-reactive polymeric film material and preferably made of apolyester (PET) film. The protective layer may have a matte finish orother “textured” features to improve the optical detection of thecleaning device by the testing equipment and/or improve cleaningefficiency.

Installation of the cleaning device onto the predetermined substratematerial is performed by removal a second release liner layer 205 (madeof the same material as the first release liner layer) to expose theadhesive layer 204, followed by application onto the substrate surfaceby the adhesive layer 204. The adhesive layer 204 may then be placedagainst a substrate adhere the cleaning device 220 to the substrate. Thesubstrate may be a variety of different materials as described in theprior art which have different purposes.

The cleaning pad layer 202 described above and the cleaning pad layersdescribed below may provide predetermined mechanical, material, anddimensional characteristics to the cleaning material. For example, thecleaning pad layer may provide abrasiveness (described in more detailbelow), a specific gravity (of a range of 0.75 to 2.27 for example)wherein specific gravity is the ratio of the density to the density ofwater at a particular temperature, elasticity (of a range of 40-MPa to600-MPa for example), tackiness (of a range of 20 to 800 grams forexample), planarity, and thickness (a range between 25-um and 300-um forexample).

The one or more intermediate layers (which can be compliant as describedabove, rigid as described below or a combination of compliant and rigidlayers as described below) may provide predetermined mechanical,material, and dimensional characteristics to the cleaning material. Forexample, the one or more intermediate layers may provide abrasiveness(described in more detail below), a specific gravity (of a range of 0.75to 2.27 for example) wherein specific gravity is the ratio of thedensity of the one or more intermediate layers to the density of waterat a particular temperature, elasticity (of a range of 40-MPa to 600-MPafor example), tackiness (of a range of 20 to 800 grams for example),planarity, thickness (a range between 25-um and 300-um for example),and/or porosity (a range of 10 to 150 micropores per inch for example)which is an average number of pores per inch.

In another embodiment shown in FIG. 4B, a cleaning medium 220 may bemade from a cleaning pad layer 202 with one or more intermediate rigidlayers 206 below the cleaning pad layer 202. For another embodiment(FIG. 4C), the cleaning medium 220 may be constructed using acombination of one or more intermediate rigid 206 and compliant 203material layers beneath a cleaning pad layer 202 of predeterminedproperties. FIG. 4D shows an embodiment wherein the cleaning medium 220is constructed by alternating one or more intermediate rigid 206 andcompliant material layers 203 beneath a cleaning pad layer 202 ofpredetermined properties. The cleaning pad 202 and underlayers (203,206, etc.) will have predetermined abrasive, density, elasticity, and/ortacky properties that contribute to cleaning the contact elements withknown geometrical configurations. Superposition of the cleaning layerand intermediate material layer properties may be varied according thespecific configuration and geometrical features of the contact element.

Abrasiveness of the cleaning pad layer 202 will loosen and shear debrisfrom probe contact elements. Using predetermined volumetric and massdensities of abrasive particles; the abrasiveness of the pad can besystematically affected in order to round or sharpen the probe tips.Typical abrasive material and particle weight percentage loading withinthe cleaning material layer can range for 30% to 500% weight percent. Asused herein, weight percent polymer loading is defined as the weight ofpolymer divided by the weight of polymer plus the weight of the abrasiveparticle. Typical abrasives that may be incorporated into the materialsmay include aluminum oxide, silicon carbide, and diamond although theabrasive material may also be other well known abrasive materials. Theabrasive may include spatially or preferentially distributed particlesof aluminum oxide, silicon carbide, or diamond although the abrasiveparticles may also be other well known abrasive materials with MohsHardness of 7 or greater. Controlled surface tackiness of the cleaninglayer will cause debris on the contact element to preferentially stickto the pad and therefore be removed from the contact element during thecleaning operation.

In one embodiment, the cleaning material layer, and/or the intermediaterigid layers, and/or intermediate compliant layers (each being a“material layer”) may be made of a solid or foam-based, with open orclosed cells, elastomeric materials that may include rubbers and bothsynthetic and natural polymers. Each material layer may have a modulusof Elasticity with a range between more than 40-MPa to less than 600-MPaand the range of thickness of the layers may be between 25-um or moreand less than or equal to 300-um. Each material layer may have ahardness range of layers between 30 Shore A or more and not to exceed 90Shore A. The cleaning and adhesive layers may have a service range ofbetween −50 C to +200 C. Each elastomeric material may be a materialmanufactured with a predetermined tackiness or abrasive particlesspatially or preferentially distributed within the body of the material.Each material may have a predetermined elasticity, density and surfacetension parameters that may allow the contact elements to penetrate theelastomeric material layers and remove the debris on the contact elementwithout damage to the geometrical features of the contact element, whileretaining the integrity of the elastomeric matrix. Each material layerwill have a predetermined thickness generally between 1 and 20 milsthick. The thickness of each layer may be varied according the specificconfiguration of the probe tip. For example, a thin material cleaningmaterial layer (˜1-mil thick) would be suitable for a “non-penetrating”probe geometry such as a flat contactor and a thick material cleaninglayer (˜20-mil) would be well-suited for a “penetrating” probe geometrysuch as a spear-point or a pointed buckling beam. As one or more probeelements and supporting hardware of the tester interface contact thecleaning pad during the normal operation of the automated,semi-automated, or manual DUT handling device, a vertical contact forcedrives the contact element into the pad where the debris on the contactelements will be removed and retained by the pad material.

In other embodiments of the cleaning medium 221 (shown in FIGS. 5A and5B), the maximum cleaning efficiency of the cleaning material can beimproved using a plurality of uniformly shaped and regularly spaced,geometric micro-features, such as micro-columns 212 or micro-pyramids,of a pre-determined aspect ratio (diameter to height), cross-section(square, circular, triangular, etc.). In FIG. 5A, the spacedmicrofeatures are constructed from a single layer 212 across acombination of intermediate compliant or rigid layers 207 withpre-determined predetermined properties. As an example of one type ofmicro-feature construction, the square micro-columns shown in FIG. 5Acan be created using a combination of precision fabrication andcontrolled cutting methods whereby the major axis has a dimension of100-micron and the “street” and “avenue” widths are less than 50-um. Thedepth of the “streets” and “avenues” is controlled by the cuttingmethods in order to attain the aspect ratio. In this example, thefeatures have a 100-micron major axis width to a 200-micron depth (orheight). In this construction, the depth is attained without cuttingthrough the cleaning material layer or into the underlayer(s). In FIG.5B, the evenly spaced microfeatures may be constructed from multiplelayers 213 of intermediate compliant or rigid layers 207 withpre-determined properties. The size and geometry of the micro-featuresmay vary according the configuration and material of the contactelements to achieve a pad that will remove the debris but will notdamage the probe elements. If the micro-features are large relative tothe contact element geometry, this will adversely affect the cleaningperformance. If the micro-features are small relative to the contactelement geometry, the reciprocal force will be insufficient tofacilitate a high cleaning efficiency to remove adherent contaminants.

Generally, the microfeatures can have several types of geometriesincluding (cylinders, squares, triangles, rectangles, etc. Thecross-sectional size in major axis of each micro-feature may be greaterthan or equal to 25-um and smaller than 300-um and each micro-featuremay have an aspect ratio (height to width) that ranges between 1:10 to20:1. The micro-feature geometry may be adjusted during themanufacturing of a cleaning layer such that the material can be usedreshape, sharpen or refurbish the probe element tips.

In an embodiment, FIG. 6A and FIG. 6B show enlarged sectional views of acleaning materials with micro-features (micro-columns 219 andmicro-pyramidal 319 features of the cleaning material 224, 324,respectively); although, such features also could be any other regulargeometrical feature. The deflection of a micro-feature under loaddepends not only on the load, but also on the geometry of the feature'scross-section.

In FIG. 6A, the micro-column spacing, or pitch, 215; the area moment ofinertia or the second moment of inertia which is a property of a shapethat can be used to predict the resistance of features to bending anddeflection, 216; the cleaning pad length 217; the intermediate padlength 218; and the total length of the micro-column 219 arepredetermined according the specific configuration of the contactelement and the supporting hardware. For an array of pointed and/orspear shaped contact elements, the micro-column geometry is such thatthe cleaning features can fit “in-between” the contact elements as wellas make physical contact with the contact elements to provide cleaningaction and debris collection along the sides of the probe tips. In thisexample, a contact element interface design could have a contact elementspacing (or pitch) of 125-microns for an exposed tip length of360-micron. For the cleaning material, the feature major cross-sectionalaxis length would be less than 125-micron and the height would be atleast 60-micron to facilitate overtravel into the cleaning material. Thefeatures would provide a reciprocal force onto the pointed and/or spearshaped contact elements to initiate a cleaning and/or material removalaction. FIG. 6B, the micro-pyramid vertex spacing, or pitch, 315 and thevariable moment of inertia 316 along the height, the cleaning padpyramidal length 317, the pyramidal frustum height 318, and the totalheight of the micro-pyramid 319 are predetermined according the specificconfiguration of the contact element and the supporting hardware. As anexample, for an array of multi-point crown shaped contact elements, themicro-pyramid geometry is such the cleaning material can fit within thetines of the crown-contact and make physical contact in between thecontact elements to provide cleaning action and debris collection alongthe sides of the probe tips. For an array of multi-point crown shapedcontact elements, the micro-feature geometry is such that the cleaningfeatures can fit “in-between” and “within” the contact elements as wellas make physical contact with the contact elements to provide cleaningaction and debris collection along the sides of the probe tips. Theshape of the micro-feature would be defined by the kerf (i.e, “streetwidth and shape”, and “avenue width and shape”) if a precision cuttingprocess is used or through a molded shape if a casting process is used.As an example, a contact element interface design could have atine-to-tine spacing within the contact element of 125-microns, anexposed tine length of 300-micron, and a contact element spacing (orpitch) of 125-microns. For the micro-features of the cleaning material,the major cross-sectional axis length of the micro-feature top surfacewould be less than 125-micron to facilitate within contactor cleaning.The overall height would be at least 200-micron to facilitate overtravelinto the cleaning material and provide a sufficient reciprocal forceinto the multi-point crown shaped tip of the contact elements toinitiate the cleaning and/or material removal action.

The micro-features may have abrasive particles applied to the topsurface, along the length of the micro-feature, within the body of themicro-feature, or at the base of the micro-feature. In one embodiment,an average micro-feature could have a cross-section widths of 1.0-μm ormore, with a height of 400-μm or less and an average abrasive particlesize of less than 15.0-μm. Typical abrasives that may be incorporatedinto and across the material layers and micro-features may includealuminum oxide, silicon carbide, and diamond although the abrasiveparticles may also be other well known abrasive materials with MohsHardness of 7 or greater. The amount and size of the abrasive materialadded to the micro-features may vary according the configuration andmaterial of the contact elements to achieve a pad that will remove andcollect the debris but will not damage the contact elements or supporthardware.

FIGS. 7A, 7B, and 7C are diagrams illustrating an embodiment of thecleaning material 224 and 324, respectively, in which the micro-featuresare mutually decoupled and formed with a predetermined moment of inertiausing predetermined arrays of streets 351, avenues 352, and diagonals353 to remove undesirable interactions and other coupled effects andattain a predetermined surface compliance so that when the pin elementscontact the pad surface, a reciprocal force is imparted by the materialinto the contact area, within the contact element tip geometry, andsupport structures to increase the efficiency at which the debris andcontaminates are removed. The widths of the streets, avenues, anddiagonals size may vary according the configuration and material of theprobe elements to achieve a decoupled material surface to uniformlyremove the debris from the sides of the contact element and within thegeometrical features contact element tip. The streets, avenues, anddiagonals may have abrasive particles uniformly or preferentiallydistributed across the width. The width of the streets, avenues, anddiagonals as well as the size of the abrasive material across the widthmay vary according the configuration and material of the contactelements.

The cleaning system and cleaning pad not only removes and collectsadherent particulates from the contact element and supporting hardwaresurfaces, but maintains the shape and geometric properties of contactsurface. The insertion of the contact elements of the tester interfaceinto a cleaning device, such as the devices shown in FIG. 3A waferdevice 20; FIG. 3B substrate device 21; and FIG. 3C dummy package device22, removes adherent debris from the contact element and supportinghardware without leaving any organic residue that must be subsequentlyremoved with an additional on-line of off-line process. Furthermore, theoverall electrical characteristics of the contact element and thegeometry are unaffected; however, the overall electrical performanceneeded for high yield and low contact resistance is recovered.

Now, a method for cleaning a plurality of probe elements and supportinghardware will be described. The method accomplishes the goal of removingthe debris from contact elements without removing the tester interfacefrom the ATE, thereby increasing the productivity of the tester. Thecleaning device, that may have the same size and shape as typical DUTsbeing tested by the tester, may be inserted into a predeterminedcleaning tray. The cleaning material layer of the device haspredetermined physical, mechanical, and geometrical properties accordingthe configuration and material of the contact elements and supportinghardware of the tester interface.

An embodiment of the cleaning material with the micro-features suitablefor cleaning the contact elements 13 of a tester interface 12 for waferlevel test such as tungsten needles, vertical probes, cobra probes, MEMstype probes, plunger probes, spring probes, sliding contacts, contactbump probes formed on a membrane, etc. For this illustrative example, astandard cantilevered probe card, is shown in FIG. 8A. The cleaningmaterial 224 is installed onto a wafer substrate 20 or a cleaning areasubstrate 500. At a specified interval, the contact elements are cleanedwhen the cleaning material 224 is driven in contact with the contactelements to some pre-set vertical position. The spacing 215, moment ofinertia 216, and total length 219 of the micro-columns configured basedon the configuration and material of the contact elements 400, in thiscase cantilevered probe needles. As the contact elements 400 areexercised into the cleaning material 224, debris is removed contact thesurface of the contact element as well as along the side of the tiplength. The spacing, geometry, and abrasiveness of the micro-columns issuch that the reciprocal pressure on the contact elements impartsefficient cleaning to remove and collect debris from the contactelements.

As described above, this cleaning step may occur either when thecleaning device is periodically installed from the cleaning traypositioned under the contact elements of tester interface or every timefrom the wafer cassette, or anytime the ATE executes a cleaningoperation of the contact elements with the cleaning material installedonto the burnishing plate. Use of the cleaning device does notinterrupt, in any way, the operation of the ATE since the cleaning ofthe contact elements is accomplished during the normal operation of thetesting machine. In this manner, the cleaning device is inexpensive andpermits the contact element to be cleaned and/or shaped without removingthe contact elements or tester interface from the ATE. Now, anotherembodiment of the cleaning device will be described.

Now, another embodiment of the cleaning device will be described whereinthe cleaning device may be used for cleaning contact elements that areused to electrically test the DUTs wherein an individual semiconductordevice from the wafer has been encapsulated into a material, such asplastic. The above embodiment would be typically used for a system thattests the wafers or one or more dies on a semiconductor wafer prior tobeing singulated and/or encapsulated into an assembled package. In thisillustrative example, the cleaning device may also be used with an ATEand tester for handling and testing packaged integrated circuits (IC).The IC package may have one or more electrical leads or solder ballsextending out from the package that communicate electrical signals, suchas a power signal, a ground signal, etc., with the die inside of thepackage 15. The tester interface, in this case called test socket 12,will have a plurality of contact elements 13 (similar to the probe cardtester described above) that contact the leads of the package and testthe electrical characteristics of the packaged DUT. Commonly, thecontact elements are mounted onto spring loaded test probes and a havegeometrical configuration with single spear-like 403 or crown-likefeatures with multiple tines 402.

Similar to the probe card cleaner embodiment, the cleaning device mayapproximate a DUT shape with a substrate onto which the cleaning padmaterial has been applied 22 such that contact elements of the testsocket may contact the cleaning pad surface periodically to removedebris from the tips of the probe elements. The size of the cleaningdevice may be modified to fit the size and shape of the particularsocket or to approximate the dimensions of a particular device. In themicro-featured embodiment shown in FIG. 8B, the micro-pyramid structures324 may be used wherein the geometrical features of the cleaning devicehave spacing, geometry, and abrasiveness is such that the reciprocalpressure on the contact elements imparts efficient cleaning to removeand collect debris from the within the center of contact elements 405.Decoupling of the micro-pyramid structures 326, with streets 350,avenues 351, and diagonals 352, with widths and depths is predeterminedaccording to the configuration and material of the contact elements. Thespacing, geometry, and abrasiveness of the micro-pyramids is such thatthe reciprocal pressure on the contact elements imparts efficientcleaning to remove and collect debris from the contact elements. Thus,the number of pad/polymer/substrate layers and surface micro-featuresmay be controlled to provide control of the overall thickness of thecleaning device as well as the compliance of the thickness of thecleaning. This multi-layer embodiment would also provide “edge-side”cleaning for the interior of the socket and contactors of the prober.

The methods and apparatus provide one or more advantages including butnot limited to maintaining clean contactors and contact pins. While thedisclosure has been described with reference to certain illustrativeembodiments, those described herein are not intended to be construed ina limiting sense. For example, variations or combinations of steps inthe embodiments shown and described may be used in particular caseswithout departure from the disclosure. Various modifications andcombinations of the illustrative embodiments as well as other advantagesand embodiments of the disclosure will be apparent to persons skilled inthe arts upon reference to the drawings, description, and claims. It isintended that the scope of the disclosure be defined by the claimsappended hereto and their equivalents.

While the foregoing has been with reference to a particular embodimentof the invention, it will be appreciated by those skilled in the artthat changes in this embodiment may be made without departing from theprinciples and spirit of the disclosure, the scope of which is definedby the appended claims.

1. A test probe cleaning material for cleaning the contact elements andsupport structures of testing interfaces used for wafer level or packagelevel IC semiconductor device functional testing, the cleaning materialcomprising: a cleaning pad layer; one or more intermediate layersunderneath the cleaning pad layer, the one or more intermediate layerssupporting the cleaning pad layer and having a set of predeterminedcharacteristics of the one or more intermediate layers that are selectedto optimize the cleaning material for a particular contact elements andsupport structures of testing interfaces, wherein a modulus ofelasticity has a range between more than 40-MPa to 600-MPa, each layerhas a thickness between 25-um and 300-um and each layer has a hardnessbetween 30 Shore A and 90 Shore A; and wherein the intermediate layersfurther comprises a plurality of abrasive particles having a MohsHardness of 7 or greater that are selected to optimize the cleaningmaterial for a particular contact elements and support structures oftesting interfaces.
 2. The cleaning material of claim 1, wherein the oneor more intermediate layers further comprises one or more compliantlayers.
 3. The cleaning material of claim 1, wherein the one or moreintermediate layers further comprises one or more rigid layers.
 4. Thecleaning material of claim 1, wherein the one or more intermediatelayers further comprises at least one rigid layer and at least onecompliant layer.
 5. The cleaning material of claim 1, wherein the one ormore intermediate layers provide one or more of an abrasiveness, aspecific gravity, an elasticity, tackiness, planarity, thickness and aporosity.
 6. The cleaning material of claim 5, wherein the cleaning padlayer provides one or more of an abrasiveness, a specific gravity, anelasticity, tackiness, planarity, thickness and a porosity.
 7. Thecleaning material of claim 2, wherein each compliant layer is made ofone or more of rubbers, synthetic polymers and natural polymers with aporosity within a range from 10 to 150 micropores per inch.
 8. Thecleaning material of claim 3, wherein each rigid layer is made of one ormore of rubbers, synthetic polymers and natural polymers with a porositywithin a range from 10 to 150 micropores per inch
 9. The cleaningmaterial of claim 1, wherein the plurality of abrasive particles furthercomprises one or more kinds of particles selected from the groupconsisting of aluminum oxide, silicon carbide, and diamond.
 10. Thecleaning material of claim 1, wherein the plurality of abrasiveparticles further comprises a blend of one or more types of particlesselected from the group consisting of aluminum oxide, silicon carbide,and diamond.
 11. The cleaning material of claim 1, wherein the pluralityof abrasive particles further comprises a blend of one or more particlesthat each have sizes selected from a size range between 0.05-um and15-um.
 12. The cleaning material of claim 11, wherein the plurality ofabrasive particles further comprises a blend of one or more types ofparticles selected from the group consisting of aluminum oxide, siliconcarbide, and diamond.
 13. The cleaning material of claim 1, wherein theplurality of abrasive particles is spatially distributed within theintermediate materials layers.
 14. The cleaning material of claim 1further comprising a sacrificial top protective layer to protect andisolate the cleaning pad layer from contamination.
 15. The cleaningmaterial of claim 1 further comprising an adhesive layer attached to theone or more intermediate layers that secure the cleaning material to asubstrate.
 16. The cleaning material of claim 15 further comprising aremovable release liner that is removed to expose the adhesive layer.17. The cleaning material of claim 1, wherein the cleaning pad layerfurther comprises a plurality of geometric micro-features withpredetermined geometrical and dimensional properties that are selectedto optimize the cleaning material so that the contact area andsurrounding support hardware are cleaned without modification or damage.18. A test probe cleaning material for cleaning the contact elements andsupport structures of testing interfaces used for wafer level or packagelevel IC semiconductor device functional testing, the cleaning materialcomprising: a cleaning pad layer having a plurality of geometricmicro-features with predetermined geometrical and dimensional propertiesthat are selected to optimize the cleaning material so that the contactarea and surrounding support hardware are cleaned without modificationor damage and wherein the cleaning pad layer further comprises aplurality of abrasive particles having a Mohs Hardness of 7 or greaterthat are selected to optimize the cleaning material for a particularcontact elements and support structures of testing interfaces; and oneor more intermediate layers underneath the cleaning pad layer, the oneor more intermediate layers supporting the cleaning pad layer and havinga set of predetermined characteristics of the one or more intermediatelayers that are selected to optimize the cleaning material for aparticular contact elements and support structures of testinginterfaces, wherein a modulus of elasticity has a range between morethan 40-MPa to 600-MPa, each layer has a thickness between 25-um and300-um and each layer has a hardness between 30 Shore A and 90 Shore A.19. The cleaning material of claim 18, wherein each geometricmicro-feature is uniformly shaped and regularly spaced.
 20. The cleaningmaterial of claim 18, wherein the micro-features cross-section and theplurality of abrasive particles improve debris removal and collectionefficiency.
 21. The cleaning material of claim 18, wherein eachmicro-feature has an aspect ratio and a resultant second moment of areaor inertia to control the resistance of the micro-feature to bending.22. The cleaning material of claim 18, wherein the plurality of abrasiveparticles are applied to one of a top surface of each micro-feature,along the sides of each micro-feature and on faces of eachmicro-feature.
 23. The cleaning material of claim 18, wherein theplurality of abrasive particles are distributed within the body of eachmicro-feature.
 24. The cleaning material of claim 18, wherein theplurality of abrasive particles are applied at the base of eachmicro-feature.
 25. A cleaning device for cleaning the pin contactelements and support hardware in a semiconductor testing apparatus, thecleaning device comprising: a cleaning layer with a predeterminedconfiguration appropriate for the particular pin contact elements; asubstrate having a configuration to be introduced into the testingapparatus during the normal testing operating of the testing apparatus,wherein the substrate comprises a surrogate semiconductor wafer orpackaged IC device; the cleaning layer, secured to the substrate, havingpredetermined characteristics that cause the pad to clean debris the pincontact elements and support hardware when the pin contact elements andsupport hardware contact the pad so that the pin contact elements andsupport hardware are cleaned, without modification to normal operationof the testing machine.
 26. The device of claim 25 further comprisingone or more intermediate layers that provide one or more of anabrasiveness, a specific gravity, an elasticity, tackiness, planarity,thickness and a porosity.
 27. The device of claim 26, wherein thecleaning pad layer provides one or more of an abrasiveness, a specificgravity, an elasticity, tackiness, planarity, thickness and a porosity28. The device of claim 26, wherein the one or more intermediate layersfurther comprises one or more compliant layers.
 29. The device of claim26, wherein the one or more intermediate layers further comprises one ormore rigid layers.
 30. The device of claim 26, wherein the one or moreintermediate layers further comprises at least one rigid layer and atleast one compliant layer.
 31. The device of claim 28, wherein eachcompliant layer is made of one or more of rubbers, synthetic polymersand natural polymers with having a porosity within a range from 10 to150 micropores per inch.
 32. The device of claim 29, wherein each rigidlayer is made of one or more of rubbers, synthetic polymers and naturalpolymers with a porosity within a range from 10 to about 150 pores perinch.
 33. A cleaning device for cleaning the pin contact elements andsupport hardware in a semiconductor testing apparatus, the cleaningdevice comprising: a cleaning layer with a predetermined configurationappropriate for the particular pin contact elements, the cleaning layerhaving a plurality of geometric micro-features with predeterminedgeometrical and dimensional properties that are selected to optimize thecleaning material so that the contact area and surrounding supporthardware are cleaned without modification or damage and wherein thecleaning pad layer further comprises a plurality of abrasive particleshaving a Mohs Hardness of 7 or greater that are selected to optimize thecleaning material for a particular contact elements and supportstructures of testing interfaces; a substrate having a configuration tobe introduced into the testing apparatus during the normal testingoperating of the testing apparatus, wherein the substrate comprises asurrogate semiconductor wafer or packaged IC device; and the cleaninglayer, secured to the substrate, having predetermined characteristicsthat cause the pad to clean debris the pin contact elements and supporthardware when the pin contact elements and support hardware contact thepad so that the pin contact elements and support hardware are cleaned,without modification to normal operation of the testing machine.
 34. Thedevice of claim 33, wherein each geometric micro-feature is uniformlyshaped and regularly spaced.
 35. The device of claim 33, wherein themicro-features cross-section and the plurality of abrasive particlesimprove debris removal and collection efficiency.
 36. The device ofclaim 33, wherein each micro-feature has an aspect ratio and a resultantsecond moment of area or inertia to control the resistance to bending ofthe micro-feature.
 37. The device of claim 33, wherein the plurality ofabrasive particles are applied to one of a top surface of eachmicro-feature, along the sides of each micro-feature and on faces ofeach micro-feature.
 38. The device of claim 33, wherein the plurality ofabrasive particles are distributed within the body of eachmicro-feature.
 39. The device of claim 33, wherein the plurality ofabrasive particles are applied at the base of each micro-feature.
 40. Amethod for cleaning the pin contact elements and support hardware in asemiconductor testing apparatus such as a wafer prober or devicehandler, the method comprising: loading a cleaning device into the waferprober or packaged device handler, the cleaning device having the sameconfiguration IC semiconductor devices normally tested by the testingapparatus, the cleaning device having a top surface with predeterminedproperties that clean the probe elements; and contacting the pin contactelements and support hardware with the cleaning device during the normaltesting operation of the wafer prober or packaged device so that anydebris is removed from the pin contact elements and support hardwareduring the normal operation of the testing machine.
 41. The method ofclaim 40, wherein the cleaning further comprises periodically loadingone or more cleaning devices into the testing machine when the pincontact elements and support hardware are being cleaned.
 42. The methodof claim 40, wherein the loading further comprises loading one or morecleaning devices into one or more device carriers, such as wafercassettes and JEDEC trays, along with semiconductor wafers having diesbeing tested by the wafer prober or device handler so that the cleaningdevices are contacted during the testing process of the individual dieand packaged devices.
 43. The method of claim 40, wherein the pincontact elements and support hardware remain in a cleaned state for alonger period of time increases yield performance increases the amountof revenue for the manufacturer.
 44. The method of claim 40, wherein thecleaning material properties, such as density and abrasiveness can beselected for any given probe element material or shape to removeembedded or bonded debris from pin contact elements and support hardwarereducing the amount of downtime needed for manual cleaning, increasingthe throughput for the manufacturer.